Kemikal-kanikanci polishing (CMP) galibi yana da hannu tare da samar da filaye masu santsi ta hanyar halayen sinadarai, musamman yana aiki a masana'antar kera semiconductor.Lonnmeter, amintaccen mai kirkire-kirkire tare da gogewa sama da shekaru 20 akan auna tattara layukan layi, yana ba da fasahar zamani.mitoci masu yawa marasa makaman nukiliyada na'urori masu auna firikwensin danko don magance kalubalen sarrafa slurry.
Muhimmancin ingancin Slurry da Ƙwararrun Lonnmeter
slurry na inji mai gogewa shine kashin bayan tsarin CMP, yana ƙayyade daidaito da ingancin saman. Rashin daidaituwar slurry yawa ko danko na iya haifar da lahani kamar micro-scratches, cire kayan da bai dace ba, ko rufewar kushin, rashin daidaituwar ingancin wafer da haɓaka farashin samarwa. Lonnmeter, jagora na duniya a cikin hanyoyin auna masana'antu, ya ƙware a ma'aunin slurry na layi don tabbatar da ingantaccen aikin slurry. Tare da ingantaccen rikodin waƙa na isar da abin dogaro, manyan na'urori masu auna firikwensin, Lonnmeter ya haɗu tare da manyan masana'antun semiconductor don haɓaka sarrafa tsari da inganci. Mitoci masu slurry da ba na nukiliya ba da na'urori masu auna firikwensin suna ba da bayanai na ainihin lokaci, suna ba da damar daidaita daidaitattun daidaito don kiyaye daidaiton slurry da biyan buƙatun masana'antar semiconductor na zamani.
Fiye da shekaru ashirin na gwaninta a cikin ma'aunin maida hankali kan layi, wanda manyan kamfanonin semiconductor suka amince da su. An tsara na'urori masu auna firikwensin Lonnmeter don haɗin kai maras kyau da kuma kula da sifili, rage farashin aiki.Maganin da aka keɓance don saduwa da ƙayyadaddun buƙatun tsari, yana tabbatar da yawan amfanin wafer da kuma yarda.
Matsayin Kemikal Injin goge baki a cikin Masana'antar Semiconductor
Kemikal polishing (CMP), wanda kuma ake magana da shi azaman ƙirar injiniyoyi, ginshiƙi ne na masana'antar semiconductor, yana ba da damar ƙirƙirar filaye marasa lahani don samar da guntu na ci gaba. Ta hanyar haɗa etching sinadarai tare da abrasion na inji, tsarin CMP yana tabbatar da daidaiton da ake buƙata don haɗaɗɗun da'irori masu launi da yawa a nodes da ke ƙasa da 10nm. slurry na inji mai gogewa, wanda ya ƙunshi ruwa, reagents sinadarai, da ɓangarorin abrasive, yana hulɗa tare da kushin gogewa da wafer don cire abu daidai gwargwado. Kamar yadda ƙirar semiconductor ke haɓakawa, tsarin CMP yana fuskantar ƙara rikitarwa, yana buƙatar kulawa mai ƙarfi akan kaddarorin slurry don hana lahani da cimma santsi, walƙiya mai gogewa wanda Semiconductor Foundries da Masu Kayayyakin Kayayyaki ke buƙata.
Tsarin yana da mahimmanci don samar da kwakwalwan kwamfuta na 5nm da 3nm tare da ƙarancin lahani, wanda ke tabbatar da shimfidar shimfidar wuri don daidaitaccen jigo na yadudduka na gaba. Ko da ƙananan slurry rashin daidaituwa na iya haifar da sake yin aiki mai tsada ko haifar da asara.
Kalubale a cikin Kula da Kayayyakin Slurry
Tsayawa daidaitaccen ɗimbin slurry da danko a cikin aikin gyaran injiniyoyi yana cike da ƙalubale. Kaddarorin slurry na iya bambanta saboda dalilai kamar sufuri, dilution tare da ruwa ko hydrogen peroxide, rashin wadataccen haɗawa, ko lalata sinadarai. Misali, daidaitawar barbashi a cikin totes na slurry na iya haifar da ɗimbin yawa a ƙasa, wanda zai haifar da polishing mara daidaituwa. Hanyoyin sa ido na al'ada kamar pH, yuwuwar rage oxyidation-reduction (ORP), ko haɓakawa ba su da isa sosai, saboda sun kasa gano sauye-sauye masu sauƙi a cikin abun da ke cikin slurry. Waɗannan iyakoki na iya haifar da lahani, rage ƙimar cirewa, da haɓakar farashin da ake amfani da su, haifar da babban haɗari ga masana'antun kayan aikin semiconductor da masu samar da sabis na CMP. Canje-canjen haɗe-haɗe yayin sarrafawa da rarrabawa suna shafar aiki. Ƙaƙƙarfan nodes-10nm suna buƙatar kulawa mai ƙarfi akan tsaftar slurry da daidaiton haɗuwa. pH da ORP suna nuna ɗan ƙaramin bambanci, yayin da haɓakawa ya bambanta tare da tsufa. Kaddarorin slurry marasa daidaituwa na iya haɓaka ƙimar lahani har zuwa 20%, kowane binciken masana'antu.
Sensors na Layin Layi na Lonnmeter don Kulawa na Lokaci na Gaskiya
Lonnmeter yana magance waɗannan ƙalubalen tare da ci-gaban mitoci masu yawa da ba su da makaman nukiliya dana'urori masu auna firikwensin danko, gami da layin ɗanƙon mita don ma'aunin danko na cikin-layi da mita mai yawa na ultrasonic don yawan slurry na lokaci guda da saka idanu danko. An ƙera waɗannan na'urori masu auna firikwensin don haɗa kai cikin tsarin CMP, suna nuna daidaitattun haɗin gwiwar masana'antu. Maganin Lonnmeter yana ba da dogaro na dogon lokaci da ƙarancin kulawa don ƙaƙƙarfan ginin sa. Bayanai na lokaci-lokaci yana bawa masu aiki damar daidaita gaurayawan slurry, hana lahani, da haɓaka aikin goge baki, yana mai da waɗannan kayan aikin su zama makawa don Bincike da Masu Kayayyakin Gwaji da Masu Kayayyakin Kayayyakin CMP.
Fa'idodin Ci gaba da Kulawa don Inganta CMP
Ci gaba da saka idanu tare da na'urori masu auna layi na Lonnmeter suna canza tsarin aikin goge sinadarai ta hanyar isar da abubuwan da za a iya aiwatarwa da kuma tanadin farashi mai mahimmanci. Ma'aunin slurry na ainihin lokaci da saka idanu na danko yana rage lahani kamar karce ko goge sama da kashi 20%, bisa ga ma'aunin masana'antu. Haɗin kai tare da tsarin PLC yana ba da damar yin allurai ta atomatik da sarrafa tsari, yana tabbatar da kaddarorin slurry su kasance cikin mafi kyawun jeri. Wannan yana haifar da raguwar kashi 15-25% a cikin farashin da ake amfani da shi, rage ƙarancin lokaci, da ingantaccen daidaiton wafer. Ga Kafuwar Semiconductor da Masu Ba da Sabis na CMP, waɗannan fa'idodin suna fassara zuwa haɓakar haɓaka aiki, haɓakar riba mai girma, da bin ƙa'idodi kamar ISO 6976.
Tambayoyi gama-gari Game da Kula da Slurry a cikin CMP
Me yasa ma'aunin slurry ke da mahimmanci ga CMP?
Slurry yawa ma'auni tabbatar uniform barbashi rarraba da saje daidaito, hana lahani da inganta kau rates a cikin sinadaran inji polishing tsari. Yana goyan bayan samar da wafer mai inganci da bin ka'idojin masana'antu.
Ta yaya saka idanu danko ke haɓaka ingancin CMP?
Saka idanu danko yana kula da daidaitaccen kwararar ruwa, yana hana al'amurra kamar toshe kushin ko gogewar da bai dace ba. Lonnmeter's inline firikwensin yana ba da bayanan ainihin lokaci don haɓaka tsarin CMP da haɓaka yawan amfanin wafer.
Menene ke sanya mitoci masu yawa na Lonnmeter na musamman?
Mitoci masu yawa na slurry na Lonnmeter suna ba da yawa lokaci guda da ma'aunin danko tare da babban daidaito da kiyaye sifili. Ƙaƙƙarfan ƙira su yana tabbatar da aminci a cikin buƙatar yanayin aiwatar da CMP.
Ma'aunin slurry na ainihin lokaci da sa ido na danko suna da mahimmanci don haɓaka aikin aikin goge sinadarai a masana'antar semiconductor. Lonnmeter's wadanda ba na nukiliya slurry mita da kuma danko firikwensin samar da Semiconductor Equipment Manufacturers, CMP Consumables Suppliers, da Semiconductor Foundries tare da kayan aiki don shawo kan slurry management kalubale, rage lahani, da ƙananan farashi. Ta hanyar isar da madaidaicin bayanai na ainihin lokaci, waɗannan mafita suna haɓaka ingantaccen tsari, tabbatar da yarda, da fitar da riba a cikin gasa ta kasuwar CMP. ZiyarciYanar Gizo na Lonnmeterko tuntuɓi ƙungiyar su a yau don gano yadda Lonnmeter zai iya canza ayyukan gyaran injin ku.
Lokacin aikawa: Yuli-22-2025
